Invention Grant
- Patent Title: Circuit board structure and manufacturing method thereof
- Patent Title (中): 电路板结构及其制造方法
-
Application No.: US12258453Application Date: 2008-10-27
-
Publication No.: US08288655B2Publication Date: 2012-10-16
- Inventor: Ra-Min Tain , Ming-Ji Dai
- Applicant: Ra-Min Tain , Ming-Ji Dai
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW97133281A 20080829
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K1/09 ; H05K1/00 ; H05K7/20

Abstract:
A circuit board structure and a manufacturing method thereof are provided. The circuit board structure includes a composite substrate, a dielectric layer, and a circuit layer. The composite substrate includes a metal substrate doped with non-metal powders and a metal buffer layer. A surface of the metal buffer layer opposite to the other surface of the metal buffer layer in contact with the metal substrate is treated by a polishing process. The dielectric layer is formed on the polished surface of the metal buffer layer, and the circuit layer is formed on the dielectric layer. Alternatively, a barrier layer is interposed between the dielectric layer and the metal buffer layer for preventing a diffusion effect of the metal buffer layer.
Public/Granted literature
- US20100051328A1 CIRCUIT BOARD STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2010-03-04
Information query