发明授权
US08290736B2 Calibration standards and methods of their fabrication and use 有权
校准标准及其制作和使用方法

  • 专利标题: Calibration standards and methods of their fabrication and use
  • 专利标题(中): 校准标准及其制作和使用方法
  • 申请号: US12710497
    申请日: 2010-02-23
  • 公开(公告)号: US08290736B2
    公开(公告)日: 2012-10-16
  • 发明人: Jinbang Tang
  • 申请人: Jinbang Tang
  • 申请人地址: US TX Austin
  • 专利权人: Freescale Semiconductor, Inc.
  • 当前专利权人: Freescale Semiconductor, Inc.
  • 当前专利权人地址: US TX Austin
  • 代理商 Sherry W. Schumm
  • 主分类号: G01R31/02
  • IPC分类号: G01R31/02
Calibration standards and methods of their fabrication and use
摘要:
An embodiment of a calibration standard includes a substrate, a set of conductive structures fabricated on the substrate, and a conductive end structure fabricated on the substrate. The set of conductive structures include an inner conductive structure, a first outer conductive structure positioned to one side of the inner conductive structure, and a second outer conductive structure positioned to an opposite side of the inner conductive structure. The inner and outer conductive structures are aligned in parallel with each other along offset principal axes of the inner and outer conductive structures. The conductive end structure is electrically connected between an end of the first outer conductive structure and an end of the second outer conductive structure, and the conductive end structure is spatially separated from an end of the inner conductive structure at the surface of the substrate.
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