Invention Grant
- Patent Title: Filtration systems and fitting arrangements for filtration systems
- Patent Title (中): 过滤系统和过滤系统的配套安排
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Application No.: US12885601Application Date: 2010-09-20
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Publication No.: US08293104B2Publication Date: 2012-10-23
- Inventor: Hajime Hiranaga , Tatsuya Hoshino , Itoh Hiromichi
- Applicant: Hajime Hiranaga , Tatsuya Hoshino , Itoh Hiromichi
- Applicant Address: US NY Port Washington
- Assignee: Pall Corporation
- Current Assignee: Pall Corporation
- Current Assignee Address: US NY Port Washington
- Agency: Leydig, Voit & Mayer, Ltd.
- Main IPC: B01D35/00
- IPC: B01D35/00

Abstract:
Filtration systems may comprise a manifold having a fitting and a filter having a fitting. One of the manifold fitting and the filter fitting may comprise a nozzle including a tip portion having a contact surface. The other of the manifold fitting and the filter fitting may comprise a receptacle which receives the nozzle and has a contact surface. The filter may be removably mountable to the manifold with the filter fitting detachably engaging the manifold fitting and the contact surface at the tip portion of the nozzle abutting and sealing against the contact surface of the receptacle to prevent leakage at the end of the nozzle.
Public/Granted literature
- US20110005989A1 FILTRATION SYSTEMS AND FITTING ARRANGEMENTS FOR FILTRATION SYSTEMS Public/Granted day:2011-01-13
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