发明授权
- 专利标题： Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins
- 专利标题（中）： 碱显影树脂，其制备方法和包含碱显影树脂的光敏组合物
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申请号： US12449450申请日： 2008-02-11
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公开(公告)号： US08304169B2公开(公告)日： 2012-11-06
- 发明人: Min-Young Lim , Han-Soo Kim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim
- 申请人： Min-Young Lim , Han-Soo Kim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim
- 申请人地址： KR Seoul
- 专利权人： LG Chem, Ltd.
- 当前专利权人： LG Chem, Ltd.
- 当前专利权人地址： KR Seoul
- 代理机构： McKenna Long & Aldridge LLP
- 优先权： KR10-2007-0013145 20070208
- 国际申请： PCT/KR2008/000790 WO 20080211
- 国际公布： WO2008/097065 WO 20080814
- 主分类号： G03F7/032
- IPC分类号： G03F7/032 ; G03F7/028 ; G03F7/027
摘要：
The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the photosensitive composition, the photosensitivity, the developability and the film remaining rate of the pattern are improved.