Invention Grant
- Patent Title: Electron beam focusing electrode and electron gun using the same
- Patent Title (中): 电子束聚焦电极和使用其的电子枪
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Application No.: US12285671Application Date: 2008-10-10
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Publication No.: US08304743B2Publication Date: 2012-11-06
- Inventor: Chan Wook Baik , Anurag Srivastava , Jong Min Kim , Sun Il Kim , Young Mok Son , Gun Sik Park , Jin Kyu So
- Applicant: Chan Wook Baik , Anurag Srivastava , Jong Min Kim , Sun Il Kim , Young Mok Son , Gun Sik Park , Jin Kyu So
- Applicant Address: KR Gyeonggi-do KR Seoul
- Assignee: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- Current Assignee: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- Current Assignee Address: KR Gyeonggi-do KR Seoul
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2008-0046748 20080520
- Main IPC: G21K5/04
- IPC: G21K5/04
Abstract:
An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
Public/Granted literature
- US20090289542A1 Electron beam focusing electrode and electron gun using the same Public/Granted day:2009-11-26
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