发明授权
- 专利标题: Electron beam focusing electrode and electron gun using the same
- 专利标题(中): 电子束聚焦电极和使用其的电子枪
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申请号: US12285671申请日: 2008-10-10
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公开(公告)号: US08304743B2公开(公告)日: 2012-11-06
- 发明人: Chan Wook Baik , Anurag Srivastava , Jong Min Kim , Sun Il Kim , Young Mok Son , Gun Sik Park , Jin Kyu So
- 申请人: Chan Wook Baik , Anurag Srivastava , Jong Min Kim , Sun Il Kim , Young Mok Son , Gun Sik Park , Jin Kyu So
- 申请人地址: KR Gyeonggi-do KR Seoul
- 专利权人: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- 当前专利权人: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- 当前专利权人地址: KR Gyeonggi-do KR Seoul
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2008-0046748 20080520
- 主分类号: G21K5/04
- IPC分类号: G21K5/04
摘要:
An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
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