发明授权
- 专利标题： Method for processing workpiece with photoresist layer
- 专利标题（中）： 用光刻胶层处理工件的方法
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申请号： US12921116申请日： 2008-12-15
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公开(公告)号： US08309296B2公开(公告)日： 2012-11-13
- 发明人: Yoshihisa Usami
- 申请人： Yoshihisa Usami
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2008-055611 20080305
- 国际申请： PCT/JP2008/003762 WO 20081215
- 国际公布： WO2009/110046 WO 20090911
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method for processing a workpiece (10) having a photoresist layer (12) using an exposure device (30) is disclosed. A transparent sheet (20) which allows transmission of light emitted from the exposure device (30) is disposed between an object lens (35a) of the exposure device (30) and the photoresist layer (12), and the photoresist layer (12) is exposed to the light through the transparent sheet (20).
公开/授权文献
- US20110003255A1 METHOD FOR PROCESSING WORKPIECE WITH PHOTORESIST LAYER 公开/授权日：2011-01-06
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