发明授权
- 专利标题： Method and apparatus for cleaning a substrate surface
- 专利标题（中）： 清洗基材表面的方法和设备
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申请号： US13175446申请日： 2011-07-01
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公开(公告)号： US08309440B2公开(公告)日： 2012-11-13
- 发明人: Errol Antonio C. Sanchez , Johanes Swenberg , David K. Carlson , Roisin L. Doherty
- 申请人： Errol Antonio C. Sanchez , Johanes Swenberg , David K. Carlson , Roisin L. Doherty
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： H01L21/20
- IPC分类号： H01L21/20
摘要：
Embodiments described herein provide methods for processing a substrate. One embodiment comprises positioning a substrate in a processing region of a processing chamber, exposing a surface of the substrate disposed in the processing chamber to an oxygen containing gas to form a first oxygen containing layer on the surface, removing at least a portion of the first oxygen containing layer to expose at least a portion of the surface of the substrate, and exposing the surface of the substrate to an oxygen containing gas to form a second oxygen containing layer on the surface.
公开/授权文献
- US20110263103A1 METHOD AND APPARATUS FOR CLEANING A SUBSTRATE SURFACE 公开/授权日：2011-10-27
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