Invention Grant
- Patent Title: Preparation and manufacture of an overlayer for deactivation resistant photocatalysts
- Patent Title (中): 制备和制造防失光光催化剂的覆层
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Application No.: US12302603Application Date: 2007-05-31
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Publication No.: US08309484B2Publication Date: 2012-11-13
- Inventor: Treese Hugener-Campbell , Thomas Henry Vanderspurt , David F. Ollis , Stephen O. Hay , Timothy N. Obee , Wayde R. Schmidt , Michael A. Kryzman
- Applicant: Treese Hugener-Campbell , Thomas Henry Vanderspurt , David F. Ollis , Stephen O. Hay , Timothy N. Obee , Wayde R. Schmidt , Michael A. Kryzman
- Applicant Address: US CT Farmington
- Assignee: Carrier Corporation
- Current Assignee: Carrier Corporation
- Current Assignee Address: US CT Farmington
- Agency: Cantor Colburn LLP
- International Application: PCT/US2007/012813 WO 20070531
- International Announcement: WO2007/143013 WO 20071213
- Main IPC: B01J21/00
- IPC: B01J21/00 ; B01J23/00 ; B01J25/00 ; B01J29/00 ; B01D53/22 ; B01D59/12 ; B32B3/00 ; B32B3/26

Abstract:
A photocatalyst system for volatile organic compounds with two parts that include a photocatalyst layer on a substrate and a porous overlayer. The photocatalyst layer is reactive with volatile organic compounds when UV light is projected on it. The overlayer is situated on the photocatalyst layer. The overlayer is UV transparent and has an interconnected pore network that allows contaminated air to pass through the overlayer. The size and the shape of the interconnected pores acts to selectively exclude certain contaminants that can deactivate the photocatalyst.
Public/Granted literature
- US20090185966A1 PREPARATION AND MANUFACTURE OF AN OVERLAYER FOR DEACTIVATION RESISTANT PHOTOCATALYSTS Public/Granted day:2009-07-23
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