发明授权
- 专利标题: Method for single-stage treatment of siliceous subterranean formations
- 专利标题(中): 硅质地层单层处理方法
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申请号: US12019394申请日: 2008-01-24
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公开(公告)号: US08312929B2公开(公告)日: 2012-11-20
- 发明人: Wayne W. Frenier , Diankui Fu , Stephen Nigel Davies , Murtaza Ziauddin , Zhijun Xiao , Bruno Lecerf , Helene Bulte
- 申请人: Wayne W. Frenier , Diankui Fu , Stephen Nigel Davies , Murtaza Ziauddin , Zhijun Xiao , Bruno Lecerf , Helene Bulte
- 申请人地址: US TX Sugar Land
- 专利权人: Schlumberger Technology Corporation
- 当前专利权人: Schlumberger Technology Corporation
- 当前专利权人地址: US TX Sugar Land
- 代理商 Michael Dae; Daryl Wright; Robin Nava
- 主分类号: E21B43/28
- IPC分类号: E21B43/28
摘要:
In a method of treating a sandstone-containing formation penetrated by a wellbore, a treatment fluid comprising an aqueous fluid containing a Bronsted acid, a hydrogen fluoride source and an organic acid or salt thereof that is substantially soluble in the aqueous fluid is formed. The treatment fluid contains less than about 2% of fluoride (F−) by weight of the fluid and from 2% or less of sodium (Na+) by weight of the fluid. The treatment fluid is introduced into the formation through the wellbore as a single-stage without introducing an acid-containing fluid preflush into the formation prior to introducing the treatment fluid.
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