发明授权
- 专利标题： Apparatus and methods for chemical vapor deposition
- 专利标题（中）： 化学气相沉积的装置和方法
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申请号： US13109533申请日： 2011-05-17
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公开(公告)号： US08313804B2公开(公告)日： 2012-11-20
- 发明人: David K. Carlson , Errol Sanchez , Satheesh Kuppurao
- 申请人： David K. Carlson , Errol Sanchez , Satheesh Kuppurao
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Diehl Servilla LLC
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; C23C16/448 ; C23C16/38 ; C23C16/30
摘要：
Methods and apparatus are disclosed for the formation of vaporizing liquid precursor materials. The methods or apparatus can be used as part of a chemical vapor deposition apparatus or system, for example for forming films on substrates. The methods and apparatus involve providing a vessel for containing a liquid precursor and diffusing element having external cross-section dimensions substantially equal to the internal cross-sectional dimensions of the vessel.
公开/授权文献
- US20110217466A1 APPARATUS AND METHODS FOR CHEMICAL VAPOR DEPOSITION 公开/授权日：2011-09-08