发明授权
US08314003B2 Nonvolatile memory devices that use resistance materials and internal electrodes, and related methods and processing systems
有权
使用电阻材料和内部电极的非易失性存储器件,以及相关方法和处理系统
- 专利标题: Nonvolatile memory devices that use resistance materials and internal electrodes, and related methods and processing systems
- 专利标题(中): 使用电阻材料和内部电极的非易失性存储器件,以及相关方法和处理系统
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申请号: US13101263申请日: 2011-05-05
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公开(公告)号: US08314003B2公开(公告)日: 2012-11-20
- 发明人: In-Gyu Baek , Hyun-Jun Sim , Jin-Shi Zhao , Eun-Kyung Yim
- 申请人: In-Gyu Baek , Hyun-Jun Sim , Jin-Shi Zhao , Eun-Kyung Yim
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec
- 优先权: KR2008-0023416 20080313
- 主分类号: H01L21/20
- IPC分类号: H01L21/20
摘要:
A nonvolatile memory device, a method of fabricating the nonvolatile memory device and a processing system including the nonvolatile memory device. The nonvolatile memory device may include a plurality of internal electrodes that extend in a direction substantially perpendicular to a face of a substrate, a plurality of first external electrodes that extend substantially in parallel with the face of the substrate, and a plurality of second external electrodes that also extend substantially in parallel with the face of the substrate. Each first external electrode is on a first side of a respective one of the internal electrodes, and each second external electrode is on a second side of a respective one of the internal electrodes. These devices also include a plurality of variable resistors that contact the internal electrodes, the first external electrodes and the second external electrodes.
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