发明授权
US08314011B2 Epitaxial lift off stack having a non-uniform handle and methods thereof
有权
具有不均匀手柄的外延提升堆栈及其方法
- 专利标题: Epitaxial lift off stack having a non-uniform handle and methods thereof
- 专利标题(中): 具有不均匀手柄的外延提升堆栈及其方法
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申请号: US12475418申请日: 2009-05-29
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公开(公告)号: US08314011B2公开(公告)日: 2012-11-20
- 发明人: Thomas Gmitter , Gang He , Andreas Hegedus
- 申请人: Thomas Gmitter , Gang He , Andreas Hegedus
- 申请人地址: US CA Santa Clara
- 专利权人: Alta Devices, Inc.
- 当前专利权人: Alta Devices, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L21/46
- IPC分类号: H01L21/46
摘要:
Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods used to form such films and devices. In one embodiment, a method for forming a thin film material during an epitaxial lift off process is provided which includes forming an epitaxial material over a sacrificial layer on a substrate, adhering a non-uniform support handle onto the epitaxial material, and removing the sacrificial layer during an etching process. The etching process further includes peeling the epitaxial material from the substrate while forming an etch crevice therebetween and bending the support handle to form compression in the epitaxial material during the etching process. In one example, the non-uniform support handle contains a wax film having a varying thickness.
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