Invention Grant
- Patent Title: Metamaterial inclusion structure and method
- Patent Title (中): 超材料夹杂物结构与方法
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Application No.: US12245612Application Date: 2008-10-03
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Publication No.: US08315500B2Publication Date: 2012-11-20
- Inventor: Jingjing Li , Shih-Yuan Wang , Wei Wu
- Applicant: Jingjing Li , Shih-Yuan Wang , Wei Wu
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: G02B6/00
- IPC: G02B6/00

Abstract:
A metamaterial inclusion structure (MIS), a metamaterial and a method of producing an optical magnetic response employ interspersed plasmonic and dielectric materials. The MIS includes first petals of a plasmonic material and second petals of a dielectric material that alternate at a surface and along a periphery of the MIS. The MIS exhibits the magnetic resonance when illuminated by an optical signal at an optical wavelength. The optical signal has a magnetic field component that is parallel with an interface between the first petals and the second petals. The metamaterial includes a plurality of the MIS arranged in an array and provides an optical magnetic susceptibility at the optical wavelength. The method forms the MIS with the alternating petals and includes illuminating the MIS with the optical signal.
Public/Granted literature
- US20100086272A1 Metamaterial Inclusion Structure and Method Public/Granted day:2010-04-08
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