发明授权
- 专利标题： Optical-image-intensity calculating method, pattern generating method, and manufacturing method of semiconductor device
- 专利标题（中）： 光学图像强度计算方法，图案生成方法和半导体器件的制造方法
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申请号： US12960074申请日： 2010-12-03
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公开(公告)号： US08318393B2公开(公告)日： 2012-11-27
- 发明人: Masanori Takahashi , Satoshi Tanaka
- 申请人： Masanori Takahashi , Satoshi Tanaka
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2009-286973 20091217
- 主分类号： G03F9/00
- IPC分类号： G03F9/00
摘要：
According to the embodiment, an optical image intensity distribution to be formed in a resist arranged on a lower layer side of a diffraction pattern is calculated by performing a whole image exposure from an upper surface side of the diffraction pattern formed on a substrate. The optical image intensity distribution is calculated by using a multimode waveguide analysis model or a fractional Fourier transform with respect to the diffraction pattern.
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