发明授权
US08318656B2 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
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生产工艺和系统,组合物,表面活性剂,单体单元,金属络合物,磷酸酯,二醇,水性成膜泡沫和泡沫稳定剂
- 专利标题: Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
- 专利标题(中): 生产工艺和系统,组合物,表面活性剂,单体单元,金属络合物,磷酸酯,二醇,水性成膜泡沫和泡沫稳定剂
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申请号: US13024836申请日: 2011-02-10
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公开(公告)号: US08318656B2公开(公告)日: 2012-11-27
- 发明人: Janet Boggs , Stephan Brandstadter , John Chien , Vimal Sharma , E. Bradley Edwards , Vicki Hedrick , Andrew Jackson , Gregory Leman , Edward Norman , Robert Kaufman
- 申请人: Janet Boggs , Stephan Brandstadter , John Chien , Vimal Sharma , E. Bradley Edwards , Vicki Hedrick , Andrew Jackson , Gregory Leman , Edward Norman , Robert Kaufman
- 申请人地址: US DE Wilmington
- 专利权人: E. I. du Pont de Nemours and Company
- 当前专利权人: E. I. du Pont de Nemours and Company
- 当前专利权人地址: US DE Wilmington
- 主分类号: C11D1/00
- IPC分类号: C11D1/00 ; C11D3/24 ; C07C17/00 ; C07C19/08 ; C07C21/18 ; C07C22/08
摘要:
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the Rf-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
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