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US08320043B2 Illumination apparatus for microlithographyprojection system including polarization-modulating optical element 有权
包括偏光调制光学元件的微光刻投影系统的照明装置

Illumination apparatus for microlithographyprojection system including polarization-modulating optical element
摘要:
A polarization-modulating optical element including an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
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