发明授权
- 专利标题: Illumination apparatus for microlithographyprojection system including polarization-modulating optical element
- 专利标题(中): 包括偏光调制光学元件的微光刻投影系统的照明装置
-
申请号: US12205572申请日: 2008-09-05
-
公开(公告)号: US08320043B2公开(公告)日: 2012-11-27
- 发明人: Damian Fiolka , Markus Deguenther
- 申请人: Damian Fiolka , Markus Deguenther
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT GmbH
- 当前专利权人: Carl Zeiss SMT GmbH
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 主分类号: G02B5/30
- IPC分类号: G02B5/30 ; F21V9/14 ; G03B27/72
摘要:
A polarization-modulating optical element including an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
公开/授权文献
- US20090002675A1 POLARIZATION-MODULATING OPTICAL ELEMENT 公开/授权日:2009-01-01
信息查询