发明授权
- 专利标题: Nonvolatile semiconductor memory device
- 专利标题(中): 非易失性半导体存储器件
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申请号: US12725827申请日: 2010-03-17
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公开(公告)号: US08320182B2公开(公告)日: 2012-11-27
- 发明人: Ryouhei Kirisawa , Masaru Kito , Shigeto Oota , Yoshimasa Mikajiri
- 申请人: Ryouhei Kirisawa , Masaru Kito , Shigeto Oota , Yoshimasa Mikajiri
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2009-202063 20090901
- 主分类号: G11C11/34
- IPC分类号: G11C11/34 ; G11C16/04
摘要:
A nonvolatile semiconductor memory device includes: a memory unit; and a control unit. The memory unit includes: first and second memory strings including first and second memory transistors with first and second select gates, respectively; and first and second wirings connected thereto. In a selective erase operation of a selected cell transistor of the first memory transistors, the control unit applies V1 voltage to the first wiring, applies V2 voltage lower than V1 to a selected cell gate of the selected cell transistor, applies V3 voltage not higher than V1 and higher than V2 to a non-selected cell gate of the first memory transistors, applies V1 or V4 voltage not higher than V1 and not lower than V3 to the first select gate, and applies V2 or V4 voltage higher than V2 and not higher than V3 to the second wiring or sets the second wiring in a floating state.
公开/授权文献
- US20110051527A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE 公开/授权日:2011-03-03
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