发明授权
- 专利标题: Production method of polishing composition
- 专利标题(中): 抛光组合物的生产方法
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申请号: US11920532申请日: 2006-05-10
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公开(公告)号: US08323368B2公开(公告)日: 2012-12-04
- 发明人: Noriyuki Takakuma , Isao Ota , Kenji Tanimoto
- 申请人: Noriyuki Takakuma , Isao Ota , Kenji Tanimoto
- 申请人地址: JP Tokyo
- 专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2005-147825 20050520
- 国际申请: PCT/JP2006/309414 WO 20060510
- 国际公布: WO2006/123562 WO 20061123
- 主分类号: B24D3/02
- IPC分类号: B24D3/02 ; C09C1/68 ; C09K3/14
摘要:
[Problems to Be Solved]To provide a method for obtaining a polishing composition by which a polishing speed is high and the polished surface has little surface failure.[Means to Solve the Problems]The present invention relates to a production method of a polishing composition containing zirconia oxide sol including: baking at a temperature ranging from 400 to 1000° C., a zirconium compound having d50 (where d50 represents a particle diameter meaning that the number of particles having this particle diameter or less is 50% of the total number of particles) of zirconium compound particles of 5 to 25 μm and d99 (where d99 represents a particle diameter meaning that the number of particles having this particle diameter or less is 99% of the total number of particles) of zirconium compound particles of 60 μm or less, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry; and wet-grinding a powder of zirconium oxide obtained in the above baking in an aqueous medium until d50 of zirconium oxide particles becomes 80 to 150 nm and d99 of zirconium oxide particles becomes 150 to 500 nm, wherein d50 and d99 are measured by measuring the slurry of the zirconium compound by a laser diffractometry.[Selected Drawings]None.
公开/授权文献
- US20080254718A1 Production Method of Polishing Composition 公开/授权日:2008-10-16
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