发明授权
- 专利标题： Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film
- 专利标题（中）： 近红外吸收染料，近红外吸收膜形成组合物和近红外吸收膜
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申请号： US13108534申请日： 2011-05-16
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公开(公告)号： US08323536B2公开(公告)日： 2012-12-04
- 发明人: Masaki Ohashi , Takeshi Kinsho , Kazumi Noda , Seiichiro Tachibana
- 申请人： Masaki Ohashi , Takeshi Kinsho , Kazumi Noda , Seiichiro Tachibana
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2010-253448 20101112
- 主分类号： F21V9/04
- IPC分类号： F21V9/04 ; F21V9/06 ; G02B5/22 ; G02B5/26 ; G03C1/00 ; G03F7/00
摘要：
A near-infrared absorbing dye has an anion of formula (1) wherein A1 is H or CF3, R0 is OH or —OC(═O)—R′, and R′ is a monovalent hydrocarbon group. The dye has excellent solvent solubility as well as good optical properties and heat resistance, offering the advantages of easy coating and effective working during film formation. The dye free of heavy metal in its structure is advantageously used in the process of fabricating semiconductor devices.
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