发明授权
US08323762B2 Method for manufacturing medium on which information is recorded in pit pattern
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用于制造以凹坑图案记录信息的介质的方法
- 专利标题: Method for manufacturing medium on which information is recorded in pit pattern
- 专利标题(中): 用于制造以凹坑图案记录信息的介质的方法
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申请号: US12673565申请日: 2008-05-16
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公开(公告)号: US08323762B2公开(公告)日: 2012-12-04
- 发明人: Yoshihisa Usami , Tetsuya Watanabe
- 申请人: Yoshihisa Usami , Tetsuya Watanabe
- 申请人地址: JP Tokyo
- 专利权人: Fujifilm Corporation
- 当前专利权人: Fujifilm Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2007-212149 20070816
- 国际申请: PCT/JP2008/001227 WO 20080516
- 国际公布: WO2009/022442 WO 20090219
- 主分类号: B32B3/02
- IPC分类号: B32B3/02
摘要:
A method by which depressions and projections (pit pattern) can be formed directly and easily in a substrate made of inorganic material is provided. A method for forming a medium on which information is recorded in a pit pattern comprises the steps of: forming a recording material layer over a substrate made of inorganic material wherein the recording material layer is of a thermally deformable heat mode recording material; forming a plurality of holes by application of condensed light to the recording material layer; and forming a plurality of pits in the substrate wherein the plurality of pits corresponding to the plurality of holes are etched by using as a mask the recording material layer in which the plurality of holes are formed.
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