发明授权
- 专利标题： Antimony-free photocurable resin composition and three dimensional article
- 专利标题（中）： 无锑光固化树脂组合物和三维制品
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申请号： US12092490申请日： 2006-10-26
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公开(公告)号： US08334025B2公开(公告)日： 2012-12-18
- 发明人: John Wai Fong , Richard N. Leyden , Laurence Messe , Ranjana C. Patel , Carole Chapelat
- 申请人： John Wai Fong , Richard N. Leyden , Laurence Messe , Ranjana C. Patel , Carole Chapelat
- 申请人地址： US SC Rock Hill
- 专利权人： 3D Systems, Inc.
- 当前专利权人： 3D Systems, Inc.
- 当前专利权人地址： US SC Rock Hill
- 国际申请： PCT/EP2006/067804 WO 20061026
- 国际公布： WO2007/048819 WO 20070503
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/038 ; B22C7/02 ; B29C67/00 ; A61L27/14 ; A61L29/04 ; C09D11/10 ; G09B23/28
摘要：
The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cationic photoinitiator (v) a free radical photoinitiator, and (vi) a toughening agent. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications.
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