Invention Grant
- Patent Title: Method for manufacturing optical nonreciprocal element
- Patent Title (中): 制造光学不可逆元件的方法
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Application No.: US12665635Application Date: 2008-02-25
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Publication No.: US08335407B2Publication Date: 2012-12-18
- Inventor: Hideki Yokoi
- Applicant: Hideki Yokoi
- Applicant Address: JP Koto-Ku, Tokyo
- Assignee: Shibaura Institute of Technology
- Current Assignee: Shibaura Institute of Technology
- Current Assignee Address: JP Koto-Ku, Tokyo
- Agency: Foley & Lardner LLP
- International Application: PCT/JP2008/053214 WO 20080225
- International Announcement: WO2009/107194 WO 20090903
- Main IPC: G02B6/12
- IPC: G02B6/12

Abstract:
A novel technique is provided, which can secure sufficient adhesion of an Si layer and a magneto-optical material layer while avoiding occurrence of cracks when fabricating an optical nonreciprocal element by bonding the Si layer on which a rib waveguide is formed, and the magneto-optical material layer. The method includes forming a waveguide on the Si layer of an SOI substrate which is a first substrate, forming a first thin-film buffer layer on the aforesaid waveguide, forming a second thin-film buffer layer on an magneto-optical material layer deposited on a second substrate by using a same material as that of the aforesaid first thin-film buffer layer, and bonding the aforesaid first thin-film buffer layer and the aforesaid second thin-film buffer layer in placement where a light propagating in the aforesaid waveguide can be caused to generate nonreciprocal phase change by the aforesaid magneto-optical material layer.
Public/Granted literature
- US20100307678A1 METHOD FOR MANUFACTURING OPTICAL NONRECIPROCAL ELEMENT Public/Granted day:2010-12-09
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