发明授权
US08338251B2 Method of manufacture transistor with reduced charge carrier mobility
有权
制造具有降低的载流子迁移率的晶体管的方法
- 专利标题: Method of manufacture transistor with reduced charge carrier mobility
- 专利标题(中): 制造具有降低的载流子迁移率的晶体管的方法
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申请号: US13472514申请日: 2012-05-16
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公开(公告)号: US08338251B2公开(公告)日: 2012-12-25
- 发明人: Joerg Berthold , Christian Pacha , Klaus von Arnim
- 申请人: Joerg Berthold , Christian Pacha , Klaus von Arnim
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Infineon Techn. AG
- 代理商 Philip H Schlazer
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
One or more embodiments of the invention relate to a method comprising: treating a fin of a first n-channel access transistor in a static random access memory cell to have a lower charge carrier mobility than a fin of a first n-channel pull-down transistor in a first inverter in the memory cell, the first n-channel access transistor being coupled between a first bit line and a first node of the first inverter; and treating a fin of a second n-channel access transistor in the memory cell to have a lower charge carrier mobility than a fin of a second n-channel pull-down transistor in a second inverter in the memory cell, the second n-channel access transistor being coupled between a second bit line and a second node of the second inverter.
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