发明授权
US08339559B2 Liquid crystal display unit structure including a patterned etch stop layer above a first data line segment
有权
液晶显示单元结构包括在第一数据线段之上的图案化蚀刻停止层
- 专利标题: Liquid crystal display unit structure including a patterned etch stop layer above a first data line segment
- 专利标题(中): 液晶显示单元结构包括在第一数据线段之上的图案化蚀刻停止层
-
申请号: US13466195申请日: 2012-05-08
-
公开(公告)号: US08339559B2公开(公告)日: 2012-12-25
- 发明人: Liu-Chung Lee , Hsiang-Lin Lin , Kuo-Yu Huang
- 申请人: Liu-Chung Lee , Hsiang-Lin Lin , Kuo-Yu Huang
- 申请人地址: TW Hsinchu
- 专利权人: AU Optronics Corp.
- 当前专利权人: AU Optronics Corp.
- 当前专利权人地址: TW Hsinchu
- 代理机构: McClure, Qualey & Rodack, LLP
- 优先权: TW96150764A 20071228
- 主分类号: G02F1/136
- IPC分类号: G02F1/136 ; G02F1/1333 ; G02F1/1343 ; H01L29/04 ; H01L29/10 ; H01L31/00 ; H01L27/14 ; H01L29/15 ; H01L31/036
摘要:
A liquid crystal display unit structure and the manufacturing method thereof are provided. The liquid crystal display unit structure comprises a patterned first metal layer with a first data line segment and a gate line on a substrate; a patterned dielectric layer covering the first data line and the gate line having a plurality of first openings and a second opening therein, a patterned etch stop layer having a first portion located above the first data line segment and a second portion; a patterned second metal layer including a common electrode line, a second data line segment, a source electrode and a drain electrode, wherein the first portion of the patterned etch stop layer is between the first data line segment and the common line; a patterned passivation layer and a patterned transparent conductive layer.
公开/授权文献
信息查询
IPC分类: