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US08344420B1 Enhancement-mode gallium nitride high electron mobility transistor 有权
增强型氮化镓高电子迁移率晶体管

Enhancement-mode gallium nitride high electron mobility transistor
Abstract:
Embodiments include but are not limited to apparatuses and systems including a heterostructure having a first barrier layer, a gallium nitride channel layer on the first barrier layer, and a second barrier layer on the gallium nitride channel layer and including a first sublayer, a second sublayer, and a third sublayer. The first barrier layer, the first sublayer, and the third sublayer may each include aluminum. Other embodiments may be described and claimed.
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