Invention Grant
US08347901B2 Substrate cleaning method, substrate cleaning system and program storage medium
有权
基板清洗方法，基板清洗系统和程序存储介质
- Patent Title: Substrate cleaning method, substrate cleaning system and program storage medium
- Patent Title (中): 基板清洗方法，基板清洗系统和程序存储介质
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Application No.: US11717170Application Date: 2007-03-13
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Publication No.: US08347901B2Publication Date: 2013-01-08
- Inventor: Tsukasa Watanabe , Naoki Shindo , Takahiro Furukawa , Yuji Kamikawa
- Applicant: Tsukasa Watanabe , Naoki Shindo , Takahiro Furukawa , Yuji Kamikawa
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2006-070538 20060315
- Main IPC: B08B3/12
- IPC: B08B3/12
Abstract:
The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate to be processed W is subjected to an ultrasonic cleaning process. While the substrate to be processed is being cleaned, a dissolved gas concentration of a gas dissolved in the cleaning liquid contained in the cleaning tank is changed.
Public/Granted literature
- US20070215172A1 Substrate cleaning method, substrate cleaning system and program storage medium Public/Granted day:2007-09-20
Information query
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