Invention Grant
- Patent Title: Disk holding apparatus and defect/foreign material detecting apparatus
- Patent Title (中): 盘保持装置和缺陷/异物检测装置
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Application No.: US12518677Application Date: 2007-12-13
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Publication No.: US08348255B2Publication Date: 2013-01-08
- Inventor: Teruyoshi Munakata
- Applicant: Teruyoshi Munakata
- Applicant Address: JP Tsukuba-shi JP Tama-shi
- Assignee: Is Technology Japan, Inc.,Raytex Corporation
- Current Assignee: Is Technology Japan, Inc.,Raytex Corporation
- Current Assignee Address: JP Tsukuba-shi JP Tama-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-336988 20061214
- International Application: PCT/JP2007/074027 WO 20071213
- International Announcement: WO2008/072694 WO 20080619
- Main IPC: B23Q1/64
- IPC: B23Q1/64

Abstract:
A disc holding apparatus including a plurality of movable holding claws, which have a holding section abutting to the outer circumference of a wafer having a notch and are arranged in the circumference direction of the wafer. The wafer is held by having each holding section on the inner edge side of each movable holding claw abut to the outer circumference of the wafer, thereby, at the time of detecting the notch by a sensor including a light source and a light receiving section, even when one of the holding sections abuts to the outer circumference of the wafer at a part where the notch exists, light from the light source is permitted to enter the light receiving section through the notch without being blocked by the holding section. Even when the wafer is held at the part where the notch exists, the wafer is not required to be correctly held again and throughput is improved with a shortened process time.
Public/Granted literature
- US20100025908A1 DISK HOLDING APPARATUS AND DEFECT/FOREIGN MATERIAL DETECTING APPARATUS Public/Granted day:2010-02-04
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