Invention Grant
US08348390B2 Enhancing superoleophobicity and reducing adhesion through multi-scale roughness by ALD/CVD technique in inkjet application
有权
通过ALD / CVD技术在喷墨应用中提高超亲水性并通过多尺度粗糙度降低附着力
- Patent Title: Enhancing superoleophobicity and reducing adhesion through multi-scale roughness by ALD/CVD technique in inkjet application
- Patent Title (中): 通过ALD / CVD技术在喷墨应用中提高超亲水性并通过多尺度粗糙度降低附着力
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Application No.: US13110216Application Date: 2011-05-18
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Publication No.: US08348390B2Publication Date: 2013-01-08
- Inventor: Kock-Yee Law , Hong Zhao
- Applicant: Kock-Yee Law , Hong Zhao
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agency: MH2 Technology Law Group LLP
- Main IPC: B41J2/04
- IPC: B41J2/04
Abstract:
Various embodiments provide a device having a multi-scale superoleophobic surface and methods for forming and using the device, wherein a particulate composite layer including metal-containing particulates is formed on a textured micron-/sub-micron surface of a semiconductor layer to provide device with multi-scale rough surface.
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