Invention Grant
- Patent Title: Method for burying implant to choroid
- Patent Title (中): 将植入物埋入脉络膜的方法
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Application No.: US12929112Application Date: 2011-01-03
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Publication No.: US08349005B2Publication Date: 2013-01-08
- Inventor: Masatoshi Murata
- Applicant: Masatoshi Murata
- Agent Manabu Kanesaka
- Main IPC: A61F2/14
- IPC: A61F2/14
Abstract:
After a vitreous gel of an eyeball is liquefied, a choroid is exposed; a vitreous humor is sucked to decrease a pressure in a vitreous body; a pocket is formed in the choroid; and then an implant is inserted into the pocket.
Public/Granted literature
- US20120172984A1 Method for burying implant to choroid Public/Granted day:2012-07-05
Information query
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