Invention Grant
US08349074B2 Method for detecting diameter of single crystal, single-crystal manufacturing method by using the same and single-crystal manufacturing apparatus 有权
用于检测单晶直径的方法,使用相同的单晶制造装置的单晶制造方法

  • Patent Title: Method for detecting diameter of single crystal, single-crystal manufacturing method by using the same and single-crystal manufacturing apparatus
  • Patent Title (中): 用于检测单晶直径的方法,使用相同的单晶制造装置的单晶制造方法
  • Application No.: US13061586
    Application Date: 2009-09-24
  • Publication No.: US08349074B2
    Publication Date: 2013-01-08
  • Inventor: Hiroshi OhtsunaAtsushi Iwasaki
  • Applicant: Hiroshi OhtsunaAtsushi Iwasaki
  • Applicant Address: JP Tokyo
  • Assignee: Shin-Etsu Handotai Co., Ltd.
  • Current Assignee: Shin-Etsu Handotai Co., Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2008-271206 20081021
  • International Application: PCT/JP2009/004809 WO 20090924
  • International Announcement: WO2010/047039 WO 20100429
  • Main IPC: C30B15/26
  • IPC: C30B15/26
Method for detecting diameter of single crystal, single-crystal manufacturing method by using the same and single-crystal manufacturing apparatus
Abstract:
A method for detecting a diameter of a single crystal at the time of pulling the single crystal from a silicon melt contained in a crucible according to the Czochralski method, the method including at least: using two cameras placed equidistant from each other as a target diameter upon forming a straight-body portion of the single crystal and face both ends of the diameter of the single crystal in a growth point of the single crystal respectively, to separately capture both of the ends of the growth point of the single crystal from an outside of a furnace, the growth point being a contact point between the single crystal and a melt surface; and detecting the diameter of the single crystal on the basis of the captured images. As a result, diameter detection precision is improved.
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