Invention Grant
- Patent Title: Method for detecting diameter of single crystal, single-crystal manufacturing method by using the same and single-crystal manufacturing apparatus
- Patent Title (中): 用于检测单晶直径的方法,使用相同的单晶制造装置的单晶制造方法
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Application No.: US13061586Application Date: 2009-09-24
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Publication No.: US08349074B2Publication Date: 2013-01-08
- Inventor: Hiroshi Ohtsuna , Atsushi Iwasaki
- Applicant: Hiroshi Ohtsuna , Atsushi Iwasaki
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2008-271206 20081021
- International Application: PCT/JP2009/004809 WO 20090924
- International Announcement: WO2010/047039 WO 20100429
- Main IPC: C30B15/26
- IPC: C30B15/26

Abstract:
A method for detecting a diameter of a single crystal at the time of pulling the single crystal from a silicon melt contained in a crucible according to the Czochralski method, the method including at least: using two cameras placed equidistant from each other as a target diameter upon forming a straight-body portion of the single crystal and face both ends of the diameter of the single crystal in a growth point of the single crystal respectively, to separately capture both of the ends of the growth point of the single crystal from an outside of a furnace, the growth point being a contact point between the single crystal and a melt surface; and detecting the diameter of the single crystal on the basis of the captured images. As a result, diameter detection precision is improved.
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