Invention Grant
- Patent Title: Method for fabrication of patterned micro/nano architectures using directional photo-fluidization of polymer
- Patent Title (中): 使用聚合物的定向光流化制造图案化微/纳米结构的方法
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Application No.: US12813435Application Date: 2010-06-10
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Publication No.: US08349115B2Publication Date: 2013-01-08
- Inventor: Jung-Ki Park , Seungwoo Lee , Jihye Lee
- Applicant: Jung-Ki Park , Seungwoo Lee , Jihye Lee
- Applicant Address: KR Daejeon
- Assignee: Korea Advanced Institute of Science & Technology
- Current Assignee: Korea Advanced Institute of Science & Technology
- Current Assignee Address: KR Daejeon
- Agency: Baker & Hostetler LLP
- Priority: KR2009-0124842 20091215
- Main IPC: B32B38/00
- IPC: B32B38/00

Abstract:
Disclosed is a method for fabrication of a patterned micro-architectural array by directional photo-fluidization of a polymer, which includes a process for formation of a micro-architectural array, the method comprising preparing a micro-fluidic device by bonding a rubber mold having a micro-pattern to a substrate, introducing a polymer solution to the micro-fluidic device, drying the polymer to form a polymer line array corresponding to a pattern of a micro-fluidic tube, inducing directional photo-fluidization by light radiation to control shape and size of the micro-architectural array, and applying metal to the polymer array having controlled structure by directional photo-fluidization then selectively removing the polymer, in order to transfer the shape of the polymer onto the micro-architectural array. Precisely controlled and various micro-architectures having different sizes as well as regular alignment shapes may be fabricated in large scale and parallel mode by transferring the foregoing controlled template onto the architecture.
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