发明授权
- 专利标题: Method for fabrication of patterned micro/nano architectures using directional photo-fluidization of polymer
- 专利标题(中): 使用聚合物的定向光流化制造图案化微/纳米结构的方法
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申请号: US12813435申请日: 2010-06-10
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公开(公告)号: US08349115B2公开(公告)日: 2013-01-08
- 发明人: Jung-Ki Park , Seungwoo Lee , Jihye Lee
- 申请人: Jung-Ki Park , Seungwoo Lee , Jihye Lee
- 申请人地址: KR Daejeon
- 专利权人: Korea Advanced Institute of Science & Technology
- 当前专利权人: Korea Advanced Institute of Science & Technology
- 当前专利权人地址: KR Daejeon
- 代理机构: Baker & Hostetler LLP
- 优先权: KR2009-0124842 20091215
- 主分类号: B32B38/00
- IPC分类号: B32B38/00
摘要:
Disclosed is a method for fabrication of a patterned micro-architectural array by directional photo-fluidization of a polymer, which includes a process for formation of a micro-architectural array, the method comprising preparing a micro-fluidic device by bonding a rubber mold having a micro-pattern to a substrate, introducing a polymer solution to the micro-fluidic device, drying the polymer to form a polymer line array corresponding to a pattern of a micro-fluidic tube, inducing directional photo-fluidization by light radiation to control shape and size of the micro-architectural array, and applying metal to the polymer array having controlled structure by directional photo-fluidization then selectively removing the polymer, in order to transfer the shape of the polymer onto the micro-architectural array. Precisely controlled and various micro-architectures having different sizes as well as regular alignment shapes may be fabricated in large scale and parallel mode by transferring the foregoing controlled template onto the architecture.
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