A method for forming a photocatalytic apatite includes a target production step (S12) for producing a sputtering target that contains photocatalytic apatite, and a sputtering step (S13) for forming a photocatalytic apatite film on a substrate by sputtering using the target. A firing step (S11) for firing the photocatalytic apatite is conducted before the sputtering step so as to increase the crystallinity of the photocatalytic apatite.