Invention Grant
- Patent Title: Method of increasing the laser damage threshold of diffraction gratings
- Patent Title (中): 增加衍射光栅的激光损伤阈值的方法
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Application No.: US11883435Application Date: 2006-02-16
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Publication No.: US08349226B2Publication Date: 2013-01-08
- Inventor: Stefan Borneis , Eckehard Onkels , Dasa Javorkova , Paul Neumayer
- Applicant: Stefan Borneis , Eckehard Onkels , Dasa Javorkova , Paul Neumayer
- Applicant Address: DE Darmstadt
- Assignee: GSI Helmholtzzentrum fur Schwerionenforschung GmbH
- Current Assignee: GSI Helmholtzzentrum fur Schwerionenforschung GmbH
- Current Assignee Address: DE Darmstadt
- Agency: Reising Ethington PC
- Priority: EP05003757 20050222
- International Application: PCT/EP2006/001410 WO 20060216
- International Announcement: WO2006/089681 WO 20060831
- Main IPC: B29D11/00
- IPC: B29D11/00

Abstract:
For increasing the laser damage threshold (LDT) of diffraction gratings, particularly of multi-layer dielectric diffraction (MLD) gratings, the invention proposes a method for treating a diffraction grating to be used in a high energy laser apparatus having a first laser with the steps of providing the diffraction grating, providing a second treatment laser and irradiating the diffraction grating with laser light from the second treatment laser until the laser damage threshold of the diffraction grating has increased.Furthermore, the invention proposes a diffraction grating treated according to the method, as well as a laser system, which comprises such a diffraction grating.
Public/Granted literature
- US20090028206A1 Method of Increasing the Laser Damage Threshold of Diffraction Gratings Public/Granted day:2009-01-29
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