Invention Grant
US08349227B2 Method of fabricating a mold and method of producing an antireflection film using the mold
有权
使用该模具制造模具的方法和制造抗反射膜的方法
- Patent Title: Method of fabricating a mold and method of producing an antireflection film using the mold
- Patent Title (中): 使用该模具制造模具的方法和制造抗反射膜的方法
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Application No.: US12805189Application Date: 2010-07-16
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Publication No.: US08349227B2Publication Date: 2013-01-08
- Inventor: Ichiro Ihara
- Applicant: Ichiro Ihara
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2008-333674 20081226
- Main IPC: B29D11/00
- IPC: B29D11/00

Abstract:
A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
Public/Granted literature
- US20110012272A1 Method of fabricating a mold and method of producing an antireflection film using the mold Public/Granted day:2011-01-20
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