Invention Grant
- Patent Title: Plasma generator and reaction apparatus
- Patent Title (中): 等离子发生器和反应装置
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Application No.: US12594167Application Date: 2008-03-27
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Publication No.: US08349266B2Publication Date: 2013-01-08
- Inventor: Yuichiro Ishizaki
- Applicant: Yuichiro Ishizaki
- Applicant Address: JP Kyoto
- Assignee: Kyocera Corporation
- Current Assignee: Kyocera Corporation
- Current Assignee Address: JP Kyoto
- Agency: DLA Piper LLP (US)
- Priority: JP2007-090847 20070330
- International Application: PCT/JP2008/055876 WO 20080327
- International Announcement: WO2008/123357 WO 20081016
- Main IPC: B01J19/08
- IPC: B01J19/08

Abstract:
Provided is a plasma generator which can eliminate breakage due to thermal stress without deteriorating plasma generating efficiency. A plasma generator 1 has an base member 3 provided with a discharge space 5 and a pair of electrodes 9 provided on the base member 3 while sandwiching the discharge space 5 therebetween, wherein at least one electrode 7 of the pair of electrodes 9 has a plurality of electrode layers 15 provided at positions different from each other in a facing direction of the pair of electrodes 9.
Public/Granted literature
- US20100135867A1 Plasma Generator and Reaction Apparatus Public/Granted day:2010-06-03
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