Invention Grant
- Patent Title: Liquid discharge method and liquid discharge device
- Patent Title (中): 液体排出法和排液装置
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Application No.: US12543178Application Date: 2009-08-18
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Publication No.: US08349405B2Publication Date: 2013-01-08
- Inventor: Takeshi Ito , Kazumi Aruga , Satoru Katagami , Sadaharu Komori
- Applicant: Takeshi Ito , Kazumi Aruga , Satoru Katagami , Sadaharu Komori
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2008-219267 20080828
- Main IPC: B41J2/00
- IPC: B41J2/00 ; B41J2/01 ; B41J2/04 ; B41J2/21

Abstract:
A liquid discharge method is a method for depositing liquid on a plurality of target discharge partitioned areas formed on a substrate as the liquid is selectively discharged from a plurality of discharge nozzles while the substrate and the discharge nozzles are moved relative to each other. The liquid discharge method includes setting an arrangement pattern according to shapes and positions of the target discharge partitioned areas so that a number of the discharge nozzles selected to be used among the discharge nozzles capable of depositing the liquid in the target discharge partitioned areas is the same in each discharge timing.
Public/Granted literature
- US20100055324A1 LIQUID DISCHARGE METHOD AND LIQUID DISCHARGE DEVICE Public/Granted day:2010-03-04
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