Invention Grant
US08349461B2 Photo-curing polysiloxane composition and protective film formed from the same
有权
光固化聚硅氧烷组合物和由其形成的保护膜
- Patent Title: Photo-curing polysiloxane composition and protective film formed from the same
- Patent Title (中): 光固化聚硅氧烷组合物和由其形成的保护膜
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Application No.: US13213346Application Date: 2011-08-19
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Publication No.: US08349461B2Publication Date: 2013-01-08
- Inventor: Ming-Ju Wu , Chun-An Shih
- Applicant: Ming-Ju Wu , Chun-An Shih
- Applicant Address: TW Tainan
- Assignee: Chi Mei Corporation
- Current Assignee: Chi Mei Corporation
- Current Assignee Address: TW Tainan
- Agency: Fox Rothschild, LLP
- Agent Robert J. Sacco
- Priority: TW99129248A 20100831
- Main IPC: C08F2/50
- IPC: C08F2/50

Abstract:
A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains less than 30 wt % of a polysiloxane fraction having a molecular weight above 8,000, and 35 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 500 to 2,000 when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 500 and 50,000 measured by gel permeation chromatography. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.
Public/Granted literature
- US20120052439A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME Public/Granted day:2012-03-01
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