Invention Grant
US08349525B2 Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
失效
保护装置，掩模，掩模制造方法和输送装置以及曝光装置
- Patent Title: Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
- Patent Title (中): 保护装置，掩模，掩模制造方法和输送装置以及曝光装置
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Application No.: US12766621Application Date: 2010-04-23
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Publication No.: US08349525B2Publication Date: 2013-01-08
- Inventor: Noritsugu Hanazaki , Akinori Shirato
- Applicant: Noritsugu Hanazaki , Akinori Shirato
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Main IPC: G03F1/62
- IPC: G03F1/62
Abstract:
A protective apparatus that protects a predetermined area of the front surface of a mask substrate, provided with a pellicle frame that is disposed on at least a portion of the circumference of the predetermined area and bonded to the front surface of the mask substrate, and a pellicle that is mounted on the pellicle frame so as to cover an opening portion that is formed by the pellicle frame in a manner facing the predetermined area; in which the pellicle frame includes a first side portion and a second side portion, and a third side portion and a fourth side portion that are disposed at different positions along the predetermined area, and in relation to the normal direction of the front surface of the mask substrate, the rigidity of the first side portion and the second side portion is lower than the rigidity of the third side portion and the fourth side portion.
Public/Granted literature
- US20100323302A1 PROTECTIVE APPARATUS, MASK, MASK FABRICATING METHOD AND CONVEYING APPARATUS, AND EXPOSURE APPARATUS Public/Granted day:2010-12-23
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