Invention Grant
- Patent Title: Pellicle for lithography
- Patent Title (中): 光刻胶片
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Application No.: US13064335Application Date: 2011-03-21
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Publication No.: US08349526B2Publication Date: 2013-01-08
- Inventor: Toru Shirasaki
- Applicant: Toru Shirasaki
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agent Manabu Kanesaka
- Priority: JP2010-071798 20100326
- Main IPC: G03F1/64
- IPC: G03F1/64

Abstract:
There is provided a pellicle for lithography which is capable of preventing or at least restricting the outgas from its mask-bonding agglutinant layer from entering the hollow of the pellicle by virtue of a unique structure of the mask-boding agglutinant layer, that is, the agglutinant layer is formed of two or more juxtaposed endless belts of which the inner-most belt that faces the pellicle hollow is made of a substance which is non-agglutinant while at least one of the other belts is agglutinant; when the outer-most belt is also made of a non-agglutinant substance, the outgas is completely prevented from escapting from the pellicle.
Public/Granted literature
- US20110236807A1 Pellicle for lithography Public/Granted day:2011-09-29
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