Invention Grant
- Patent Title: Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
- Patent Title (中): 阻止含有热酸发生剂的下层组合物，抗下层薄膜形成基材和图案化工艺
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Application No.: US12588590Application Date: 2009-10-20
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Publication No.: US08349533B2Publication Date: 2013-01-08
- Inventor: Youichi Ohsawa , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
- Applicant: Youichi Ohsawa , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2008-286593 20081107
- Main IPC: G03F7/028
- IPC: G03F7/028 ; G03F7/029
Abstract:
A resist lower-layer composition configured to be used by a multi-layer resist method used in lithography to form a layer lower than a photoresist layer acting as a resist upper layer film. The resist lower-layer composition is insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and the resist lower-layer composition comprises, at least, a thermal acid generator for generating an acid by heating at a temperature of 100° C. or higher.
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