Invention Grant
US08349537B2 Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof
有权
用于丝网印刷的感光性油墨组合物及其使用形成正浮雕图案的方法
- Patent Title: Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof
- Patent Title (中): 用于丝网印刷的感光性油墨组合物及其使用形成正浮雕图案的方法
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Application No.: US13007373Application Date: 2011-01-14
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Publication No.: US08349537B2Publication Date: 2013-01-08
- Inventor: Maw Soe Win , Toshiyuki Goshima , Sigemasa Segawa , Shintaro Nakajima , Eika Kyo , Yoshikazu Nishikawa , Shuzo Waki
- Applicant: Maw Soe Win , Toshiyuki Goshima , Sigemasa Segawa , Shintaro Nakajima , Eika Kyo , Yoshikazu Nishikawa , Shuzo Waki
- Applicant Address: JP Yokohama-Shi
- Assignee: PI R&D Co., Ltd.
- Current Assignee: PI R&D Co., Ltd.
- Current Assignee Address: JP Yokohama-Shi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-057273 20060303
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; C08G77/04

Abstract:
Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
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