Invention Grant
US08349538B2 Photo-curable and thermo-curable resin composition, and a dry film solder resist
有权
光固化型和热固性树脂组合物,以及干膜阻焊剂
- Patent Title: Photo-curable and thermo-curable resin composition, and a dry film solder resist
- Patent Title (中): 光固化型和热固性树脂组合物,以及干膜阻焊剂
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Application No.: US13180213Application Date: 2011-07-11
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Publication No.: US08349538B2Publication Date: 2013-01-08
- Inventor: Woo-Jae Jeong , Byung-Ju Choi , Bo-Yun Choi , Kwang-Joo Lee , Min-Su Jeong
- Applicant: Woo-Jae Jeong , Byung-Ju Choi , Bo-Yun Choi , Kwang-Joo Lee , Min-Su Jeong
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2010-0025397 20100322
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/032

Abstract:
The present invention relates to a photo-curable and thermo-curable resin composition and a dry film solder resist making it possible to provide the dry film solder resist having superior heat-resistance and dimensional stability while exhibiting improved alkali developing properties. The resin composition may comprise an acid-modified oligomer having carboxyl group (—COOH) and photo-curable functional group; a photo-polymerizable monomer comprising a compound having a structure that three or more functional epoxy-acrylate groups are bonded to a heterocyclic structure containing nitrogen, and a functional group having carboxyl group is bonded to at least one epoxy-acrylate group; a thermo-curable binder having thermo-curable functional group; and a photo-initiator.
Public/Granted literature
- US20110269866A1 PHOTO-CURABLE AND THERMO-CURABLE RESIN COMPOSITION, AND A DRY FILM SOLDER RESIST Public/Granted day:2011-11-03
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