Invention Grant
- Patent Title: Semiconductor light-emitting element and method of manufacturing same
- Patent Title (中): 半导体发光元件及其制造方法
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Application No.: US12552459Application Date: 2009-09-02
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Publication No.: US08349629B2Publication Date: 2013-01-08
- Inventor: Yusuke Yokobayashi , Satoshi Tanaka , Masahiko Moteki
- Applicant: Yusuke Yokobayashi , Satoshi Tanaka , Masahiko Moteki
- Applicant Address: JP Tokyo
- Assignee: Stanley Electric Co., Ltd.
- Current Assignee: Stanley Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz, Goodman & Chick, PC
- Priority: JP2008-229467 20080908
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66

Abstract:
A semiconductor light-emitting element includes a first semiconductor layer having a first conduction type, a second semiconductor layer having a second conduction type, an active layer provided between the first and second semiconductor layers, a polarity inversion layer provided on the second semiconductor layer, and a third semiconductor layer having the second conduction type provided on the polarity inversion layer. Crystal orientations of the first through third semiconductor layers are inverted, with the polarity inversion layer serving as a boundary. The first and third semiconductor layers have uppermost surfaces made from polar faces having common constitutional elements. Hexagonal conical protrusions arising from a crystal structure are formed at outermost surfaces of the first and third semiconductor layers. The first through third semiconductor layers are made from a wurtzite-structure group III nitride semiconductor, and are layered along a C-axis direction of the crystal structure.
Public/Granted literature
- US20100059781A1 SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD OF MANUFACTURING SAME Public/Granted day:2010-03-11
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