Invention Grant
- Patent Title: Photovoltaic device and manufacturing method thereof
- Patent Title (中): 光伏器件及其制造方法
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Application No.: US12987245Application Date: 2011-01-10
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Publication No.: US08349643B2Publication Date: 2013-01-08
- Inventor: Akira Terakawa
- Applicant: Akira Terakawa
- Applicant Address: JP Moriguchi
- Assignee: Sanyo Electric Co., Ltd.
- Current Assignee: Sanyo Electric Co., Ltd.
- Current Assignee Address: JP Moriguchi
- Agency: Mots Law, PLLC
- Agent Marvin A. Motsenbocker
- Priority: JP2007-070014 20070319
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/00

Abstract:
A photovoltaic device capable of improving an output characteristic is provided. The photovoltaic device includes an n-type single-crystal silicon substrate, a p-type amorphous silicon substrate, and a substantially intrinsic i-type amorphous silicon layer disposed between the n-type single-crystal silicon substrate and the p-type amorphous silicon layer. The i-type amorphous silicon layer includes: a first section which is located on the n-type single-crystal silicon substrate side, and which has an oxygen concentration equal to or below 1020 cm−3; and a second section which is located on the p-type amorphous silicon layer side, and which has an oxygen concentration equal to or above 1020 cm−3.
Public/Granted literature
- US20110104849A1 PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-05-05
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