Invention Grant
- Patent Title: Mask and film formation method using the same
- Patent Title (中): 面膜和成膜方法使用该方法
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Application No.: US13124953Application Date: 2009-10-21
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Publication No.: US08349645B2Publication Date: 2013-01-08
- Inventor: Miwa Watai , Kazuya Saito , Takashi Komatsu , Yusuke Mizuno , Atsushi Ota , Shunji Kuroiwa
- Applicant: Miwa Watai , Kazuya Saito , Takashi Komatsu , Yusuke Mizuno , Atsushi Ota , Shunji Kuroiwa
- Applicant Address: JP Chigasaki-Shi
- Assignee: Ulvac, Inc.
- Current Assignee: Ulvac, Inc.
- Current Assignee Address: JP Chigasaki-Shi
- Agency: Grossman, Tucker, Perreault & Pfleger, PLLC
- Priority: JP2008-271222 20081021
- International Application: PCT/JP2009/005517 WO 20091021
- International Announcement: WO2010/047101 WO 20100429
- Main IPC: H01L31/18
- IPC: H01L31/18 ; B05C11/00

Abstract:
A mask includes: a tabular first section which includes a side portion and an opening portion formed at a position corresponding to a film formation region of a substrate and on which the substrate is to be disposed so that the first section overlaps a face of the substrate on which a film is to be formed; and a second section which is provided along the side portion of the first section, and covers at least one of portions of a side face of the substrate, wherein second sections of two adjacent masks overlap each other and a superposed section is thereby formed when a plurality of masks are arrayed in a lateral direction thereof.
Public/Granted literature
- US20110207261A1 MASK AND FILM FORMATION METHOD USING THE SAME Public/Granted day:2011-08-25
Information query
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