Invention Grant
- Patent Title: Display element manufacturing method and manufacturing apparatus, thin film transistor manufacturing method and manufacturing apparatus, and circuit forming apparatus
- Patent Title (中): 显示元件制造方法和制造装置，薄膜晶体管的制造方法和制造装置以及电路形成装置
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Application No.: US12978779Application Date: 2010-12-27
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Publication No.: US08349672B2Publication Date: 2013-01-08
- Inventor: Kei Nara , Tomohide Hamada
- Applicant: Kei Nara , Tomohide Hamada
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JPP2008-169957 20080630
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84
Abstract:
The thin film transistor manufacturing apparatus comprises a surface modification layer forming means, which forms a surface modification layer on a substrate, an illuminating part, which irradiates light that includes ultraviolet rays, a mask, on which the patterns of the source electrode and the drain electrode are drawn, a projection optical system, which illuminates a mask using light from the illuminating part and projects the pattern of the mask to the substrate as a pattern image, and a coating part, which coats a fluid electrode material to a region in which the surface modification layer has been modified by projection of the pattern image in order to form the source electrode and the drain electrode.
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