Invention Grant
- Patent Title: Nonvolatile semiconductor memory transistor and method for manufacturing nonvolatile semiconductor memory
- Patent Title (中): 非易失性半导体存储晶体管及其制造方法
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Application No.: US13178315Application Date: 2011-07-07
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Publication No.: US08349688B2Publication Date: 2013-01-08
- Inventor: Fujio Masuoka , Hiroki Nakamura
- Applicant: Fujio Masuoka , Hiroki Nakamura
- Applicant Address: SG Peninsula Plaza
- Assignee: Unisantis Electronics Singapore Pte Ltd.
- Current Assignee: Unisantis Electronics Singapore Pte Ltd.
- Current Assignee Address: SG Peninsula Plaza
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2010-170870 20100729
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L29/788

Abstract:
A nonvolatile semiconductor memory transistor includes an island-shaped semiconductor having a source region, a channel region, and a drain region formed in this order from the Si substrate side, a floating gate surrounding the outer periphery of the channel region with a tunnel insulating film interposed therebetween, a control gate surrounding the outer periphery of the floating gate with an inter-polysilicon insulating film interposed therebetween, and a control gate line connected to the control gate and extending in a predetermined direction. The floating gate extends to regions below and above the control gate and to a region below the control gate line. The inter-polysilicon insulating film is interposed between the floating gate and the upper surface, lower surface, and inner side surface of the control gate and between the control gate line and a portion of the floating gate that extends to the region below the control gate line.
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