Invention Grant
- Patent Title: Non-volatile memory device and method for fabricating the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US12850765Application Date: 2010-08-05
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Publication No.: US08349689B2Publication Date: 2013-01-08
- Inventor: Ki-Hong Lee , Moon-Sig Joo , Kwon Hong
- Applicant: Ki-Hong Lee , Moon-Sig Joo , Kwon Hong
- Applicant Address: KR Gyeonggi-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2010-0051420 20100531
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/8247

Abstract:
A non-volatile memory device includes a pair of columnar cell channels vertically extending from a substrate, a doped pipe channel arranged to couple lower ends of the pair of columnar cell channels, insulation layers over the substrate in which the doped pipe channel is buried, memory layers arranged to surround side surfaces of the columnar cell channels, and control gate electrodes arranged to surround the memory layers.
Public/Granted literature
- US20110291176A1 NON-VOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2011-12-01
Information query
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