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US08349689B2 Non-volatile memory device and method for fabricating the same 有权
非易失性存储器件及其制造方法

Non-volatile memory device and method for fabricating the same
Abstract:
A non-volatile memory device includes a pair of columnar cell channels vertically extending from a substrate, a doped pipe channel arranged to couple lower ends of the pair of columnar cell channels, insulation layers over the substrate in which the doped pipe channel is buried, memory layers arranged to surround side surfaces of the columnar cell channels, and control gate electrodes arranged to surround the memory layers.
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