Invention Grant
- Patent Title: Photosensitive adhesive, semiconductor device and method for manufacturing semiconductor device
- Patent Title (中): 感光胶粘剂,半导体装置及半导体装置的制造方法
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Application No.: US12745594Application Date: 2008-12-02
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Publication No.: US08349700B2Publication Date: 2013-01-08
- Inventor: Takashi Masuko , Takashi Kawamori , Kazuyuki Mitsukura , Shigeki Katogi
- Applicant: Takashi Masuko , Takashi Kawamori , Kazuyuki Mitsukura , Shigeki Katogi
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Griffin & Szipl, P.C.
- Priority: JPP2007-313906 20071204
- International Application: PCT/JP2008/071883 WO 20081202
- International Announcement: WO2009/072493 WO 20090611
- Main IPC: H01L21/30
- IPC: H01L21/30

Abstract:
A method for manufacturing a semiconductor device 1, comprising a first step of providing a photosensitive adhesive (insulating resin layer 7) on a board 3 which has a connecting terminal, a second step of patterning the photosensitive adhesive by light exposure and development so that openings 13 are formed where the connecting terminal is exposed, a third step of filling the openings 13 with a conductive material to form a conductive layer 9, and a fourth step of directly bonding a semiconductor chip 5 having a connecting electrode section to the photosensitive adhesive while electrically connecting the connecting terminal of the board 3 and the connecting electrode section of the semiconductor chip 5 via the conductive layer 9.
Public/Granted literature
- US20110031631A1 PHOTOSENSITIVE ADHESIVE, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2011-02-10
Information query
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